PMID: 8588560Dec 1, 1995Paper

A model for assessing occupational exposure to extremely low-frequency magnetic fields in fabrication rooms in the Semiconductor Health Study

American Journal of Industrial Medicine
S AbdollahzadehM B Schenker

Abstract

A model was created to assess occupational exposure to extremely low-frequency magnetic fields (ELF-MF) among semiconductor fabrication-room (fab) workers. This model was based on the assumption that each subject's exposure arose from being near identifiable ELF-MF sources or being in areas with high ELF-MF levels. To assess ELF-MF exposures, the model superimposed subjects' time-activity patterns (patterns of how and where they spent their time) with measurements of magnetic-field levels from devices and work areas. This model, which was validated by personal dosimetry on 192 persons in three fabs, predicted actual time-weighted average exposures with a correlation coefficient of 0.62. The inability of the model to predict individual exposures more accurately was attributed to unforseen sources of elevated ELF-MF (transformers, distribution panels, sources in adjacent rooms) or to errors in subjects' judgments of time spent near devices. These unpredictable errors are intrinsic to the method used to estimate exposure.

References

Nov 1, 1991·Environmental Health Perspectives·M N Bates
May 1, 1990·American Journal of Epidemiology·R R Monson
Jan 1, 1989·Epidemiologic Reviews·D A SavitzC Poole
May 1, 1969·Journal of Theoretical Biology·A L Koch
Dec 1, 1995·American Journal of Industrial Medicine·M B SchenkerS H Swan
Dec 1, 1995·American Journal of Industrial Medicine·S K HammondM B Schenker

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Citations

Jul 27, 2007·Journal of Occupational and Environmental Hygiene·Joseph D BowmanMichael G Yost
Dec 1, 1995·American Journal of Industrial Medicine·S K HammondM B Schenker
Apr 5, 2018·International Journal of Environmental Research and Public Health·Sangjun ChoiDonguk Park
Dec 1, 1995·American Journal of Industrial Medicine·C J HinesM B Schenker
Jan 30, 2007·Cancer Causes & Control : CCC·Ken Kyriakos KaripidisGraham Giles

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