Adding chemically selective subtraction to multi-material 3D additive manufacturing

Nature Communications
David GräfeChristopher Barner-Kowollik

Abstract

Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation of 3D printed microstructures under mild conditions. Three bifunctional silane crosslinkers carrying various substitutions on the silicon atom are synthesized. The photoresists are prepared by mixing these silane crosslinkers with pentaerythritol triacrylate and a two-photon photoinitiator. The presence of pentaerythritol triacrylate significantly enhances the direct laser written structures with regard to resolution, while the microstructures remain cleavable. For the targeted cleavage of the fabricated 3D microstructures, simply a methanol solution including inorganic salts is required, highlighting the mild cleavage conditions. Critically, the photoresists can be cleaved selectively, which enables the sequential degradation of direct laser written structures and allows for subtractive manufacturing at the micro- and nanoscale.

References

Jul 27, 2007·Angewandte Chemie·Christopher N LaFrattaRichard A Farrer
Aug 10, 2010·Soft Matter·Richie E KohmanHyunjoon Kong
Nov 26, 2010·Journal of the American Chemical Society·Matthew C ParrottJoseph M Desimone
May 15, 2013·Optics Express·Richard WollhofenThomas A Klar
Apr 14, 2017·Angewandte Chemie·Markus M ZiegerChristopher Barner-Kowollik
Jun 6, 2017·Angewandte Chemie·Christopher Barner-KowollikMartin Wegener
Jan 2, 2018·Archives of Oral Biology·Masahiro HirasawaNoriyuki Wakabayashi

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Citations

Jan 8, 2019·Advanced Materials·Sabrina BialasChristopher Barner-Kowollik
Aug 2, 2018·Angewandte Chemie·Nathaniel CorriganCyrille Boyer
Jun 19, 2019·Lab on a Chip·Andrew C LamontRyan D Sochol
Oct 24, 2019·Angewandte Chemie·Zhiheng ZhangCyrille Boyer
Nov 22, 2019·Angewandte Chemie·David GräfeChristopher Barner-Kowollik
Dec 4, 2019·Advanced Materials·Kenward JungCyrille Boyer
Nov 2, 2019·Angewandte Chemie·Nathaniel CorriganCyrille Boyer
Aug 20, 2019·Advanced Materials·Rhiannon BatchelorEva Blasco
Aug 14, 2019·Small·Marco Carlotti, Virgilio Mattoli
Jul 1, 2020·Advanced Science·Mohammad RafieeDaniel Therriault
Jun 4, 2019·Advanced Materials·Marvin GernhardtChristopher Barner-Kowollik
Jun 18, 2020·Scientific Reports·Edvinas SkliutasMangirdas Malinauskas
Oct 27, 2020·Advanced Science·Xiaojiang LiuZhongze Gu
May 19, 2021·Nature Communications·Xiaoyu ZhaoXiaolin Xie
Jun 27, 2019·Journal of the American Chemical Society·Hannes A HouckChristopher Barner-Kowollik
Oct 31, 2021·Advanced Materials·Marc Del PozoMichael G Debije

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Methods Mentioned

BETA
nuclear magnetic resonance
NMR
scanning electron microscopy
optical microscopy
column chromatography

Software Mentioned

ISEA
ESEA

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