Aluminosilicate dissolution kinetics: a general stochastic model

The Journal of Physical Chemistry. B
Li Zhang, Andreas Lüttge

Abstract

We apply a kinetic model developed for understanding the behavior of crystal dissolution to aluminosilicate dissolution kinetics. Without making any assumptions about specific dissolution mechanisms, the model is a vigorous stochastic exploration of all of the elementary reactions and basic processes involved in dissolution: bond breakage, bond formation, surface diffusion, and departure and arrival of Si- and Al- units. In the stochastic model, the interdependence of these elementary reactions and basic processes is strictly determined by the complicated three-dimensional surface structure in which interconnected Si- and Al- atoms share oxygen atoms. The modeling results are consistent with experimental data in various aspects, such as saturation state dependence of the dissolution rate, aluminum inhibition effects, surface chemistry evolution, anisotropic dissolution, and alteration product. The stochastic model integrates all microscopic information at the atomic scale and elucidates the reasons for the observed kinetic results in experimental studies, improving our fundamental understanding of aluminosilicate dissolution.

References

Jun 8, 2001·Journal of the American Chemical Society·R TangC A Orme
Jul 21, 2006·The Journal of Physical Chemistry. B·Antonio C Lasaga, Andreas Lüttge
Jul 28, 2006·The Journal of Physical Chemistry. B·Vera BolisPiero Ugliengo
Oct 6, 2006·The Journal of Physical Chemistry. B·David E SmithHeather D Whitley

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Citations

Apr 26, 2016·Langmuir : the ACS Journal of Surfaces and Colloids·Isabella PignatelliGaurav Sant
Sep 13, 2017·Geochimica Et Cosmochimica Acta·Alexander S BrandJeffrey W Bullard
Jul 9, 2009·Journal of the American Chemical Society·Shikha Nangia, Barbara J Garrison
Dec 6, 2016·The Journal of Physical Chemistry. C, Nanomaterials and Interfaces·Philipp PedevillaAngelos Michaelides

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