Anion-incorporation model proposed for interpreting the interfacial physical origin of the faradaic pseudocapacitance observed on anodized valve metals--with anodized titanium in fluoride-containing perchloric acid as an example

Langmuir : the ACS Journal of Surfaces and Colloids
De-Sheng Kong

Abstract

With anodized titanium in fluoride-containing perchloric acid solution as an example in the present Article, the physical origin of the faradaic pseudocapacitance C(0) frequently observed in electrochemical impedance spectroscopy (EIS) spectra at low frequencies was interpreted for the first time by the incorporation/insertion of some electrolyte anions (i.e., F(-)-ions in this work) into the oxide film under the electric field during film growth. It was shown that the emergence of the faradaic pseudocapacitive behavior not only indicates a significant incorporation of anions into the oxide films but also reflects the arrival of them at the metal/oxide interface. The anion incorporation/transfer process was depicted with a modified point-defect model and simulated by a blocking, restricted finite-length diffusion impedance model (which has been widely used for studying the ion-insertion electrodes). The fast inward migration of the incorporated electrolyte species, along with the accumulation of them at the metal/film interface (due to the blocking effect of this interface), is responsible for the low-frequency capacitance behavior revealed by a vertical capacitive line in EIS spectra at low frequencies for anodically growing o...Continue Reading

References

Jun 27, 2002·Analytical Sciences : the International Journal of the Japan Society for Analytical Chemistry·Masayuki ItagakiKazuhiko Noda
Sep 14, 2002·Faraday Discussions·Irina SerebrennikovaHenry S White
Feb 9, 2006·Nano Letters·Gopal K MorCraig A Grimes
Mar 4, 2006·Chemical Communications : Chem Comm·Wingkei HoShuncheng Lee
Oct 26, 2007·Langmuir : the ACS Journal of Surfaces and Colloids·Karthik ShankarCraig A Grimes
Apr 30, 2008·Langmuir : the ACS Journal of Surfaces and Colloids·De-Sheng Kong
Aug 2, 2008·Journal of the American Chemical Society·Francisco Fabregat-SantiagoCraig A Grimes

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