Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning

ACS Nano
Ming Fang, Johnny C Ho

Abstract

Transistors have already been made three-dimensional (3D), with device channels (i.e., fins in trigate field-effect transistor (FinFET) technology) that are taller, thinner, and closer together in order to enhance device performance and lower active power consumption. As device scaling continues, these transistors will require more advanced, fabrication-enabling technologies for the conformal deposition of high-κ dielectric layers on their 3D channels with accurate position alignment and thickness control down to the subnanometer scale. Among many competing techniques, area-selective atomic layer deposition (AS-ALD) is a promising method that is well suited to the requirements without the use of complicated, complementary metal-oxide semiconductor (CMOS)-incompatible processes. However, further progress is limited by poor area selectivity for thicker films formed via a higher number of ALD cycles as well as the prolonged processing time. In this issue of ACS Nano, Professor Stacy Bent and her research group demonstrate a straightforward self-correcting ALD approach, combining selective deposition with a postprocess mild chemical etching, which enables selective deposition of dielectric films with thicknesses and processing time...Continue Reading

References

Apr 20, 2005·Langmuir : the ACS Journal of Surfaces and Colloids·Mi H ParkMyung M Sung
Nov 13, 2007·Nature Materials·Johnny C HoAli Javey
Dec 2, 2009·Chemical Reviews·Steven M George
Oct 8, 2014·ACS Applied Materials & Interfaces·Chaiya PrasittichaiStacey F Bent
Jul 17, 2015·ACS Nano·Fatemeh Sadat Minaye HashemiStacey F Bent

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Citations

Jul 28, 2016·ACS Applied Materials & Interfaces·Lei GuoFrancisco Zaera
Jul 4, 2017·Macromolecular Rapid Communications·Cian CumminsMichael A Morris
Feb 10, 2017·The Journal of Chemical Physics·Yunxi YaoFrancisco Zaera
Jan 29, 2021·Physical Chemistry Chemical Physics : PCCP·J I Paez-OrnelasJ Guerrero-Sánchez
Mar 6, 2018·Chemistry of Materials : a Publication of the American Chemical Society·Joseph A SinghAdriaan J M Mackus
Feb 12, 2020·ACS Applied Materials & Interfaces·Taewon SuhJames R Engstrom
Nov 8, 2017·ACS Applied Materials & Interfaces·Seunggi SeoHyungjun Kim
Oct 5, 2018·ACS Applied Materials & Interfaces·A MameliF Roozeboom
Aug 19, 2017·ACS Applied Materials & Interfaces·Ivan ZyulkovSilvia Armini
Feb 19, 2019·Chemistry of Materials : a Publication of the American Chemical Society·Adriaan J M MackusWilhelmus M M Kessels
Oct 27, 2020·Langmuir : the ACS Journal of Surfaces and Colloids·Li ZhengSilvia Armini
Dec 9, 2021·Dalton Transactions : an International Journal of Inorganic Chemistry·Marceline BonvalotThierry Chevolleau
Mar 25, 2019··Colton D'AmbraChristopher Bates

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