Assessing conformal thin film growth under nonstochastic deposition conditions: application of a phenomenological model of roughness replication to synthetic topographic images.

Journal of Microscopy
M BontempiA Gambardella

Abstract

In this work, a simple method to follow the evolution of the surface of thin films during growth on substrates characterised by high roughness is detailed. To account for real cases as much as possible, the approach presented is based on the hypothesis that deposition takes place under nonstochastic conditions, such as those typical of many thin film processes in industry and technology. In this context, previous models for roughness replication, which are mainly based on idealised deposition conditions, cannot be applied and thus ad hoc approaches are required for achieving quantitative predictions. Here it is suggested that under nonstochastic conditions a phenomenological relation can be proposed, mainly based on local roughening of surface, to monitor the statistical similarity between the film and the substrate during growth or, in other words, to detect changes of the bare substrate morphological profile occurring during the film growth on top. Such approximation is based on surface representation in terms of power spectral density of surface heights, derived from topographic images; in this work, such method will be tested on two separate batches of synthetic images which simulate thin films growth onto a real rough subs...Continue Reading

References

Oct 1, 1996·Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics·D RönnowG A Niklasson
Feb 13, 1989·Physical Review Letters·R P KarunasiriJ Rudnick
Oct 20, 2015·Materials Science & Engineering. C, Materials for Biological Applications·G MarchioriM Marcacci
Oct 26, 2018·ACS Applied Materials & Interfaces·Alessandro PatelliLorenzo Moroni

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Citations

Nov 13, 2020·Journal of Microscopy·C Albonetti, G ValdrÈ

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