Athermal Azobenzene-Based Nanoimprint Lithography

Advanced Materials
Christian ProbstHans-Werner Schmidt

Abstract

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated.

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Citations

Mar 30, 2020·Scientific Reports·Ziyao Lyu, Changshun Wang
Nov 12, 2020·Langmuir : the ACS Journal of Surfaces and Colloids·Chenglong LiYing Ma

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