Atomic-Scale Patterning of Arsenic in Silicon by Scanning Tunneling Microscopy

ACS Nano
Taylor J Z StockN J Curson

Abstract

Over the past two decades, prototype devices for future classical and quantum computing technologies have been fabricated by using scanning tunneling microscopy and hydrogen resist lithography to position phosphorus atoms in silicon with atomic-scale precision. Despite these successes, phosphine remains the only donor precursor molecule to have been demonstrated as compatible with the hydrogen resist lithography technique. The potential benefits of atomic-scale placement of alternative dopant species have, until now, remained unexplored. In this work, we demonstrate the successful fabrication of atomic-scale structures of arsenic-in-silicon. Using a scanning tunneling microscope tip, we pattern a monolayer hydrogen mask to selectively place arsenic atoms on the Si(001) surface using arsine as the precursor molecule. We fully elucidate the surface chemistry and reaction pathways of arsine on Si(001), revealing significant differences to phosphine. We explain how these differences result in enhanced surface immobilization and in-plane confinement of arsenic compared to phosphorus, and a dose-rate independent arsenic saturation density of 0.24 ± 0.04 monolayers. We demonstrate the successful encapsulation of arsenic delta-layers u...Continue Reading

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Citations

Jul 16, 2021·Journal of Physics. Condensed Matter : an Institute of Physics Journal·Chan-Yuen ChangDeng-Sung Lin
Aug 19, 2021·ACS Applied Materials & Interfaces·Kevin J DwyerRobert E Butera
Aug 17, 2021·Journal of Physics. Condensed Matter : an Institute of Physics Journal·J H G OwenJ N Randall

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Methods Mentioned

BETA
scanning tunneling microscopy
X-ray

Software Mentioned

Gaussian

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