Controlling and modelling the wetting properties of III-V semiconductor surfaces using re-entrant nanostructures

Scientific Reports
Wing H NgAnthony J Kenyon

Abstract

Inorganic semiconductors such as III-V materials are very important in our everyday life as they are used for manufacturing optoelectronic and microelectronic components with important applications span from energy harvesting to telecommunications. In some applications, these components are required to operate in harsh environments. In these cases, having waterproofing capability is essential. Here we demonstrate design and control of the wettability of indium phosphide based multilayer material (InP/InGaAs/InP) using re-entrant structures fabricated by a fast electron beam lithography technique. This patterning technique enabled us to fabricate highly uniform nanostructure arrays with at least one order of magnitude shorter patterning times compared to conventional electron beam lithography methods. We reduced the surface contact fraction significantly such that the water droplets may be completely removed from our nanostructured surface. We predicted the wettability of our patterned surface by modelling the adhesion energies between the water droplet and both the patterned surface and the dispensing needle. This is very useful for the development of coating-free waterproof optoelectronic and microelectronic components where t...Continue Reading

References

Apr 22, 2004·Lab on a Chip·David EricksonDongqing Li
Dec 9, 2004·Journal of Chromatography. a·Yuan ZhangHong-Yuan Chen
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Mar 4, 2008·Langmuir : the ACS Journal of Surfaces and Colloids·Lin FengLei Jiang
Feb 6, 2010·Langmuir : the ACS Journal of Surfaces and Colloids·Bharat Bhushan, Eun Kyu Her
Sep 22, 2010·Philosophical Transactions. Series A, Mathematical, Physical, and Engineering Sciences·Bharat Bhushan, Michael Nosonovsky
Feb 21, 2013·Nature Communications·Jeppe V HolmMartin Aagesen

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Citations

Oct 30, 2018·Faraday Discussions·Anthony J KenyonAdnan Mehonic

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Methods Mentioned

BETA
electron beam lithography
AFM
chip
Atomic force microscopy

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