Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching

Nanoscale
Jie ZhangDongping Zhan

Abstract

The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold. However, direct nanoimprint on the semiconductor wafer still remains a great challenge. On the other hand, considered as a competitive fabrication method for erect high-aspect 3D-MNS, metal assisted chemical etching (MacEtch) can remove the semiconductor by spontaneous corrosion reaction at the metal/semiconductor/electrolyte 3-phase interface. Moreover, it was difficult for MacEtch to fabricate multilevel or continuously curved 3D-MNS. The question of the consequences of NIL meeting the MacEtch is yet to be answered. By employing a platinum (Pt) metalized imprint mode, we demonstrated that using electrochemical nanoimprint lithography (ECNL) it was possible to fabricate not only erect 3D-MNS, but also complex 3D-MNS with multilevel stages with continuously curved surface profiles on a gallium arsenide (GaAs) wafer. A concave microlens array with an average diameter of 58.4 μm and h...Continue Reading

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Citations

Mar 7, 2020·Nanoscale·Bugeun KiJungwoo Oh
Jul 7, 2018·Beilstein Journal of Nanotechnology·Manuel Caño-GarcíaJosé Manuel Otón
May 21, 2019·Frontiers in Chemistry·Stéphane BastideJean-Pierre Vilcot
Jun 18, 2020·Micromachines·Lucia Romano, Marco Stampanoni
Feb 21, 2019·ACS Applied Materials & Interfaces·Kyunghwan KimJungwoo Oh

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