Extreme ultraviolet microscope characterization using photomask surface roughness.

Scientific Reports
Gautam GunjalaLaura Waller

Abstract

We demonstrate a method for characterizing the field-dependent aberrations of a full-field synchrotron-based extreme ultraviolet microscope. The statistical uniformity of the inherent, atomic-scale roughness of readily-available photomask blanks enables a self-calibrating computational procedure using images acquired under standard operation. We characterize the aberrations across a 30-um field-of-view, demonstrating a minimum aberration magnitude of smaller than [Formula: see text] averaged over the center 5-um area, with a measurement accuracy better than [Formula: see text]. The measured field variation of aberrations is consistent with system geometry and agrees with prior characterizations of the same system. In certain cases, it may be possible to additionally recover the illumination wavefront from the same images. Our method is general and is easily applied to coherent imaging systems with steerable illumination without requiring invasive hardware or custom test objects; hence, it provides substantial benefits when characterizing microscopes and high-resolution imaging systems in situ.

References

Apr 1, 1977·Ultramicroscopy·H Rose
Feb 21, 2003·Applied Optics·Patrick P NaulleauSenajith Rekawa
Sep 17, 2004·Journal of Microscopy·B M HanserJ W Sedat
Jul 20, 1990·Science·H W Babcock
May 6, 2002·Optics Express·Austin RoordaMelanie Campbell
Apr 1, 1993·Applied Optics·J R FienupJ H Seldin
Jul 12, 2011·Applied Optics·Patrick P NaulleauKenneth A Goldberg
Jan 22, 2015·Journal of the Optical Society of America. A, Optics, Image Science, and Vision·Kenji YamazoeKenneth A Goldberg
Aug 18, 2018·Applied Optics·Regina EckertLaura Waller
Aug 19, 2018·Optics Express·Gautam GunjalaLaura Waller

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BETA
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SHARP

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