Fabrication-constrained nanophotonic inverse design

Scientific Reports
Alexander Y PiggottJelena Vučković

Abstract

A major difficulty in applying computational design methods to nanophotonic devices is ensuring that the resulting designs are fabricable. Here, we describe a general inverse design algorithm for nanophotonic devices that directly incorporates fabrication constraints. To demonstrate the capabilities of our method, we designed a spatial-mode demultiplexer, wavelength demultiplexer, and directional coupler. We also designed and experimentally demonstrated a compact, broadband 1 × 3 power splitter on a silicon photonics platform. The splitter has a footprint of only 3.8 × 2.5 μm, and is well within the design rules of a typical silicon photonics process, with a minimum radius of curvature of 100 nm. Averaged over the designed wavelength range of 1400-1700 nm, our splitter has a measured insertion loss of 0.642 ± 0.057 dB and power uniformity of 0.641 ± 0.054 dB.

References

Feb 8, 2013·Optics Express·Yi ZhangMichael Hochberg
Jun 6, 2013·Optics Express·Jesse Lu, Jelena Vučković
Oct 10, 2013·Optics Express·Christopher M Lalau-KeralyEli Yablonovitch
Jun 13, 2014·Optics Express·Armand C R NiederbergerRaymond G Beausoleil
Nov 28, 2014·Scientific Reports·Alexander Y PiggottJelena Vučković
Jun 10, 2016·Proceedings. Mathematical, Physical, and Engineering Sciences·Yongbo Deng, Jan G Korvink
Jul 28, 2016·Optics Express·Louise F FrellsenLars H Frandsen

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Citations

Sep 13, 2018·Water Science and Technology : a Journal of the International Association on Water Pollution Research·Lih-Fu ChenCheng-Chung Liu
Oct 18, 2019·Science Advances·Alan ZhanArka Majumdar
Feb 25, 2018·Optics Express·Andrew Michaels, Eli Yablonovitch
Feb 25, 2018·Optics Express·Logan SuJelena Vučković
Feb 6, 2019·Scientific Reports·Mohammad H TahersimaKieran Parsons
Feb 7, 2018·Optics Express·Jiahui WangShanhui Fan
Jan 18, 2019·Optics Express·Raphaël PestourieSteven G Johnson
Jun 6, 2019·Optics Express·Zin LinSteven G Johnson
Jul 28, 2019·Nature Communications·Constantin DoryJelena Vučković
Jun 23, 2019·Scientific Reports·Dries VercruysseJelena Vučković
Dec 28, 2019·Optics Express·Julián L Pita RuizAntonio André Novotny
Jan 18, 2019·Optics Express·Andrew Michaels, Eli Yablonovitch
Jan 4, 2020·Science·Neil V SapraJelena Vučkovicć
Feb 23, 2018·Applied Optics·Alan ZhanArka Majumdar
Mar 18, 2021·Optics Express·Guillermo AngerisStephen Boyd
May 15, 2021·Optics Express·Guowu ZhangOdile Liboiron-Ladouceur
May 29, 2021·Scientific Reports·Conner BallewAndrei Faraon
Jul 31, 2021·Optics Letters·Julian L Pita RuizLucas H Gabrielli
Oct 20, 2021··Duane S. BoningZhengxing Zhang
May 8, 2019··Geun Ho AhnJinhie Skarda
May 7, 2019··Jelena VučkovićJinhie Skarda
Oct 1, 2019··Logan SuAkhilesh S. P. Khope

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Methods Mentioned

BETA
electron-beam lithography

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