Fabrication of concave silicon micro-mirrors

Optics Express
Yueh Sheng OwSara Azimi

Abstract

We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 microm to 100 microm. The fabrication process involves standard photolithography followed by large area ion beam irradiation and electrochemical anodisation in a HF electrolyte. After thermal oxidation the silicon surface roughness is less than 2 nm. We also present a multilayer porous silicon distributed Bragg reflector fabricated on concave silicon surfaces which selectively reflect and focus a band of wavelengths from a parallel beam of incident white light. Development of such low roughness concave microstructures opens up new applications in areas such as silicon photonics and quantum information science.

References

Nov 20, 1995·Physical Review Letters·T PellizzariP Zoller
Nov 22, 2007·Lab on a Chip·David C Appleyard, Matthew J Lang
Aug 20, 2008·Optics Express·D MangaiyarkarasiEric T Xioasong
Apr 3, 2009·Optics Letters·Fabrice MerendaRené-Paul Salathé
Mar 20, 2006·Optics Express·Guoqiang CuiG Khitrova
May 14, 2007·Optics Express·Fabrice MerendaRené-Paul Salathé

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