Fabrication of large-area patterned porous silicon distributed Bragg reflectors

Optics Express
Dharmalingam MangaiyarkarasiEric T Xioasong

Abstract

A process to fabricate porous silicon Bragg reflectors patterned on a micrometer lateral scale over wafer areas of several square centimeters is described. This process is based on a new type of projection system involving a megavolt accelerator and a quadrupole lens system to project a uniform distribution of MeV ions over a wafer surface, which is coated with a multilevel mask. In conjunction with electrochemical anodisation, this enables the rapid production of high-density arrays of a variety of optical and photonic components in silicon such as waveguides and optical microcavities for applications in high-definition reflective displays and optical communications.

References

Feb 1, 1995·Physical Review. B, Condensed Matter·M B BreeseG W Grime
Mar 6, 2003·Nature Materials·Frédérique CuninMichael J Sailor
Apr 30, 2007·Optics Express·Mark B H Breese, Dharmalingam Mangaiyarkarasi

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Citations

Dec 7, 2013·Biomedical Microdevices·M D YnsaJ P Garcia-Ruiz
Jul 20, 2010·Optics Express·Yueh Sheng OwSara Azimi
Apr 4, 2015·Optics Express·H D LiangM B H Breese

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