Fabrication of periodic silicon nanopillars in a two-dimensional hexagonal array with enhanced control on structural dimension and period

Langmuir : the ACS Journal of Surfaces and Colloids
Jea-Young ChoiChristiana B Honsberg

Abstract

We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.

References

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Feb 12, 2014·Langmuir : the ACS Journal of Surfaces and Colloids·Dayong TengChanghui Ye
May 3, 2014·Langmuir : the ACS Journal of Surfaces and Colloids·Jea-Young ChoiChristiana B Honsberg
Jan 22, 2015·Optics Express·Inho KimKyeong-Seok Lee

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