Ge microdisk with lithographically-tunable strain using CMOS-compatible process

Optics Express
David S SukhdeoDonguk Nam

Abstract

We present germanium microdisk optical resonators under a large biaxial tensile strain using a CMOS-compatible fabrication process. Biaxial tensile strain of ~0.7% is achieved by means of a stress concentration technique that allows the strain level to be customized by carefully selecting certain lithographic dimensions. The partial strain relaxation at the edges of a patterned germanium microdisk is compensated by depositing compressively stressed silicon nitride layer. Two-dimensional Raman spectroscopy measurements along with finite-element method simulations confirm a relatively homogeneous strain distribution within the final microdisk structure. Photoluminescence results show clear optical resonances due to whispering gallery modes which are in good agreement with finite-difference time-domain optical simulations. Our bandgap-customizable microdisks present a new route towards an efficient germanium light source for on-chip optical interconnects.

References

Jan 15, 1989·Physical Review. B, Condensed Matter· Van de Walle CG
Mar 3, 2010·Optics Letters·Jifeng LiuJurgen Michel
Sep 22, 2011·Optics Express·M de KersausonP Boucaud
Nov 16, 2011·Proceedings of the National Academy of Sciences of the United States of America·Jose R Sánchez-PérezRoberto Paiella
Jan 26, 2012·Optics Express·Donguk NamKrishna Saraswat
May 9, 2012·Optics Express·Rodolfo E Camacho-AguileraJurgen Michel
Jun 16, 2015·Optics Express·Roman KoernerJoerg Schulze

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Citations

Jul 4, 2018·Journal of Physics. Condensed Matter : an Institute of Physics Journal·Zhipeng QiDonguk Nam
Jan 18, 2019·Optics Express·Abdelrahman Z Al-AttiliShinichi Saito

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