Gene Expression on DNA Biochips Patterned with Strand-Displacement Lithography

Angewandte Chemie
Günther PardatscherFriedrich C Simmel

Abstract

Lithographic patterning of DNA molecules enables spatial organization of cell-free genetic circuits under well-controlled experimental conditions. Here, we present a biocompatible, DNA-based resist termed "Bephore", which is based on commercially available components and can be patterned by both photo- and electron-beam lithography. The patterning mechanism is based on cleavage of a chemically modified DNA hairpin by ultraviolet light or electrons, and a subsequent strand-displacement reaction. All steps are performed in aqueous solution and do not require chemical development of the resist, which makes the lithographic process robust and biocompatible. Bephore is well suited for multistep lithographic processes, enabling the immobilization of different types of DNA molecules with micrometer precision. As an application, we demonstrate compartmentalized, on-chip gene expression from three sequentially immobilized DNA templates, leading to three spatially resolved protein-expression gradients.

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Citations

Nov 6, 2018·Angewandte Chemie·Lukas Aufinger, Friedrich C Simmel
Apr 3, 2019·Chembiochem : a European Journal of Chemical Biology·Xiaocui GuoDayong Yang
Aug 25, 2019·Nature Communications·Kathrin HölzMark M Somoza
Dec 5, 2019·Nature Communications·Simona RanalloFrancesco Ricci
Nov 17, 2019·Molecules : a Journal of Synthetic Chemistry and Natural Product Chemistry·Fengjie YangQiang Zhang
Dec 13, 2018·Nucleic Acids Research·Xuedong ZhengXiaopeng Wei
Jun 10, 2020·Chemistry : a European Journal·Erika SchaudyJory Lietard
Aug 11, 2021·Analytical Chemistry·Zhijuan DuanFujian Huang
Feb 5, 2019·Chemical Reviews·Friedrich C SimmelHari R Singh
Jul 4, 2019·ACS Synthetic Biology·Ziane IzriYusuke T Maeda
Dec 27, 2018·Nano Letters·Fujian HuangItamar Willner

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