Interfacial Strength and Surface Damage Characteristics of Atomically Thin h-BN, MoS2 , and Graphene

ACS Applied Materials & Interfaces
Bien-Cuong Tran KhacKoo-Hyun Chung

Abstract

Surface damage characteristics of single- and multilayer hexagonal boron nitride (h-BN), molybdenum disulfide (MoS2), and graphene films were systematically investigated via atomic force microscopy (AFM)-based progressive-force and constant-force scratch tests and Raman spectroscopy. The film-to-substrate interfacial strengths of these atomically thin films were assessed based on their critical forces (i.e., the normal force where the atomically thin film was delaminated from the underlying substrate), as determined from progressive-force scratch tests. The evolution of surface damage with respect to normal force was further investigated using constant-force tests. The results showed that single-layer h-BN, MoS2, and graphene strongly adhere to the SiO2 substrate, which significantly improves its tribological performance. Moreover, defect formation induced by scratch testing was found to affect the topography and friction force differently prior to failure, which points to distinct surface damage characteristics. Interestingly, the residual strains at scratched areas suggest that the scratch test-induced in-plane compressive strains were dominant over tensile strains, thereby leading to buckling in front of the scratching tip a...Continue Reading

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