Maskless milling of diamond by a focused oxygen ion beam

Scientific Reports
Aiden A MartinIgor Aharonovich

Abstract

Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.

References

Sep 23, 2009·ACS Nano·Max C LemmeCharles M Marcus
Aug 12, 2010·Nano Letters·David M ToyliDavid D Awschalom
May 23, 2014·Scientific Reports·Aiden A MartinIgor Aharonovich

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Methods Mentioned

BETA
chemical treatments
electron beam

Software Mentioned

Gwyddion
SRIM

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