Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution

ACS Applied Materials & Interfaces
Bo-Ru YangChuan Liu

Abstract

Patterning and alignment of conductive nanowires are essential for good electrical isolation and high conductivity in various applications. Herein a facile bottom-up, additive technique is developed to pattern and align silver nanowires (AgNWs) by manipulating wetting of dispersions in microchannels. By forming hydrophobic/hydrophilic micropatterns down to 8 μm with fluoropolymer (Cytop) and SiO2, the aqueous AgNW dispersions with the optimized surface tension and viscosity self-assemble into microdroplets and then dry to form anisotropic AgNW networks. The alignment degree characterized by the full width at half-maximum (FWHM) can be well-controlled from 39.8° to 84.1° by changing the width of microchannels. A mechanism is proposed and validated by statistical analysis on AgNW alignment, and a static model is proposed to guide the patterning of general NWs. The alignment reduced well the electrical resistivity of AgNW networks by a factor of 5 because of the formation of efficient percolation path for carrier conduction.

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Citations

Feb 18, 2016·ACS Applied Materials & Interfaces·Namsun ChouSohee Kim
Aug 23, 2016·ACS Applied Materials & Interfaces·Sung-Soo Yoon, Dahl-Young Khang
Mar 16, 2017·Biofabrication·Wenjia LiuXianting Ding
Jun 19, 2019·Nanotechnology·Ashuya TakemotoTsuyoshi Sekitani
Dec 18, 2019·Chemical Society Reviews·Hebing HuYi Long
Mar 28, 2020·Soft Matter·Gyoko Nagayama, Dejian Zhang
Oct 3, 2018·Microelectronic Engineering·Mohammadsadegh BeheshtiSunggook Park
Feb 24, 2018·ACS Applied Materials & Interfaces·Jin-Hoon Kim, Jin-Woo Park
Aug 29, 2019·ACS Omega·Ruixin BianHuan Liu

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