Micrometer-scale monolayer SnS growth by physical vapor deposition

Nanoscale
H KawamotoK Nagashio

Abstract

Recently, monolayer SnS, a two-dimensional group IV monochalcogenide, was grown on a mica substrate at the micrometer-size scale by the simple physical vapor deposition (PVD), resulting in the successful demonstration of its in-plane room temperature ferroelectricity. However, the reason behind the monolayer growth remains unclear because it had been considered that the SnS growth inevitably results in a multilayer thickness due to the strong interlayer interaction arising from lone pair electrons. Here, we investigate the PVD growth of monolayer SnS from two different feed powders, highly purified SnS and commercial phase-impure SnS. Contrary to expectations, it is suggested that the mica substrate surface is modified by sulfur evaporated from the Sn2S3 contaminant in the as-purchased powder and the lateral growth of monolayer SnS is facilitated due to the enhanced surface diffusion of SnS precursor molecules, unlike the growth from the highly purified powder. This insight provides a guide to identify further controllable growth conditions.

References

Apr 3, 2010·Science·Changgu LeeJames Hone
Mar 4, 2014·Nature Nanotechnology·Likai LiYuanbo Zhang
Aug 22, 2014·Advanced Materials·Vera SteinmannTonio Buonassisi
Sep 10, 2016·Physical Review Letters·Ruixiang FeiLi Yang
Jan 24, 2018·ACS Nano·Yu-Chuan LinJoshua A Robinson
Apr 15, 2018·Nature Communications·Shuren LinJie Yao
Nov 28, 2018·Nanoscale·Naoki HigashitarumizuKosuke Nagashio
Jun 30, 2019·Nano Letters·Yang BaoKian Ping Loh
May 18, 2020·Nature Communications·Naoki HigashitarumizuKosuke Nagashio

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Citations

Nov 18, 2021·Dalton Transactions : an International Journal of Inorganic Chemistry·Veronika BruneShashank Mishra

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Methods Mentioned

BETA
X-ray
atomic force microscopy
AFM
the
transmission electron microscopy
electron beam lithography
electron beam

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