MOS dosemeter using bismuth oxide (Bi2O3) and copper phthalocyanine (CuPc) polymer thick film

Radiation Protection Dosimetry
A ArshakK I Arshak

Abstract

A metal-oxide-silicon (MOS)-capacitor having an Ag/Bi2O3/CuPc/Ag and an MOS-transistor with Ag (gate)-Bi2O3 (gate insulator)-CuPc (semiconductor)-CdO (drain and source) structure were fabricated using screen-printing polymer thick film. The effects of gamma irradiation on the characteristics of both MOS-capacitor and MOS-transistor were investigated. The flat band voltage (VFB) of the MOS-capacitor showed a shift towards the negative gate voltage when exposed to gamma rays. The IDS-VGS characteristics displayed enhancement mode transistor for such devices. The threshold voltage was found to be 4.25 V, which displayed a linear and gradual decrease in DeltaVT = 0.5 V at VDS = 0 V and DeltaVT = 1.0 V at VDS = 2 V when exposed to gamma rays of dose step of 60 Gy.

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