Nanolithography using high transmission nanoscale bowtie apertures

Nano Letters
Liang WangXianfan Xu

Abstract

We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in photoresist by illuminating the apertures with a 355 nm laser beam polarized in the direction across the gap. Experimental results show enhanced transmission and light concentration of bowtie apertures compared to square and rectangular apertures of the same opening area. Finite different time domain simulations are used to explain the experimental results.

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Citations

Oct 27, 2012·Nano Letters·Mathieu MivelleMaria F Garcia-Parajo
Mar 16, 2012·Nano Reviews·Yanan Yue, Xinwei Wang
Jan 29, 2014·Scientific Reports·James I MitchellXianfan Xu
Feb 23, 2012·Scientific Reports·Liang PanXiang Zhang
Feb 29, 2008·Journal of Microscopy·T GrosjeanD Courjon
Apr 9, 2014·Microscopy Research and Technique·Mathieu MivelleMaria F Garcia-Parajo
Jun 3, 2016·Scientific Reports·Li DingLiang Wang
Sep 21, 2016·Nanoscale Research Letters·Yuan-Fong Chou ChauNyuk Yoong Voo
Sep 24, 2008·The Analyst·Joseph R LakowiczKazimierz Nowaczyk
Dec 10, 2009·Optics Express·Yongwoo KimJae W Hahn
Dec 10, 2009·Optics Express·Liangcheng ZhouVolkmar Dierolf
Apr 15, 2010·Optics Express·Sreemanth M V UppuluriXianfan Xu
Dec 25, 2015·Optics Express·Yuanyuan ChenReuven Gordon
Dec 23, 2016·Nanotechnology·Yang ChenLiang Wang
Apr 7, 2010·Optics Letters·Edward C Kinzel, Xianfan Xu
Aug 27, 2013·Nanotechnology·Y-C TsaiC B Arnold
Apr 26, 2017·Science Advances·Hua-Zhou ChenRen-Min Ma
May 5, 2009·Optics Letters·Qiaoqiang GanFilbert J Bartoli
Aug 3, 2011·Optics Letters·Yuping YangWeili Zhang
Mar 21, 2013·Nanotechnology·Taekyong LeeJae W Hahn

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