Nanomechanics: response of a strained semiconductor structure

Nature
Feng LiuM G Lagally

Abstract

The nanomechanical properties of thin silicon films will become increasingly critical in semiconductor devices, particularly in the context of substrates that consist of a silicon film on an insulating layer (known as silicon-on-insulator, or SOI, substrates). Here we use very small germanium crystals as a new type of nanomechanical stressor to demonstrate a surprising mechanical behaviour of the thin layer of silicon in SOI substrates, and to show that there is a large local reduction in the viscosity of the oxide on which the silicon layer rests. These findings have implications for the use of SOI substrates in nanoelectronic devices.

Citations

Jul 4, 2006·Neurotoxicology·Chuang-Hao LinTsan-Ju Chen
Oct 30, 2010·Nanoscale·Minghuang HuangMax G Lagally
Jun 30, 2011·Nanoscale Research Letters·Jakub SiegelVáclav Svorčík
Nov 5, 2004·Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics·Zhenyu HuangZ Suo
Sep 13, 2002·Physical Review Letters·Feng LiuM G Lagally
Sep 28, 2010·Physical Review Letters·Zheng LiuFeng Liu

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