Nanometric holograms based on a topological insulator material

Nature Communications
Zengji YueMin Gu

Abstract

Holography has extremely extensive applications in conventional optical instruments spanning optical microscopy and imaging, three-dimensional displays and metrology. To integrate holography with modern low-dimensional electronic devices, holograms need to be thinned to a nanometric scale. However, to keep a pronounced phase shift modulation, the thickness of holograms has been generally limited to the optical wavelength scale, which hinders their integration with ultrathin electronic devices. Here, we break this limit and achieve 60 nm holograms using a topological insulator material. We discover that nanometric topological insulator thin films act as an intrinsic optical resonant cavity due to the unequal refractive indices in their metallic surfaces and bulk. The resonant cavity leads to enhancement of phase shifts and thus the holographic imaging. Our work paves a way towards integrating holography with flat electronic devices for optical imaging, data storage and information security.

References

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Citations

Apr 4, 2018·Small·Hsiang-Chu WangDin Ping Tsai
Apr 15, 2020·Light, Science & Applications·Cheng ZhangHenri J Lezec
Sep 27, 2018·Scientific Reports·Tomas TamulevičiusSigitas Tamulevičius
May 29, 2018·Optics Express·Vin-Cent SuDin Ping Tsai
Jun 6, 2018·The Review of Scientific Instruments·J W StubbingM R S McCoustra
Jun 6, 2019·Optics Express·Ruidan KangYongtian Wang
May 18, 2019·Light, Science & Applications·Qiming ZhangMin Gu
Nov 4, 2020·Physical Chemistry Chemical Physics : PCCP·James W StubbingWendy A Brown
Dec 5, 2020·Physical Review Letters·X S WangRoberto E Troncoso
Apr 10, 2021·Light, Science & Applications·Cheng ZhangHenri J Lezec
Aug 25, 2020·Nano Letters·Yingwei WangXiangping Li
Feb 25, 2020··Zhao MengSubhadeep Datta

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Methods Mentioned

BETA
ion
electron-beam lithography
focused
X-ray
Atomic Force Microscopy

Software Mentioned

COMSOL Multiphysics

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