Nanostructure formation and passivation of large-area black silicon for solar cell applications

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Yaoping LiuXiaolong Du

Abstract

Nanoscale textured silicon and its passivation are explored by simple low-cost metal-assisted chemical etching and thermal oxidation, and large-area black silicon was fabricated both on single-crystalline Si and multicrystalline Si for solar cell applications. When the Si surface was etched by HF/AgNO(3) solution for 4 or 5 min, nanopores formed in the Si surface, 50-100 nm in diameter and 200-300 nm deep. The nanoscale textured silicon surface turns into an effective medium with a gradually varying refractive index, which leads to the low reflectivity and black appearance of the samples. Mean reflectance was reduced to as low as 2% for crystalline Si and 4% for multicrystalline Si from 300 to 1000 nm, with no antireflective (AR) coating. A black-etched multicrystalline-Si of 156 mm × 156 mm was used to fabricate a primary solar cell with no surface passivation or AR coating. Its conversion efficiency (η) was 11.5%. The cell conversion efficiency was increased greatly by using surface passivation process, which proved very useful in suppressing excess carrier recombination on the nanostructured surface. Finally, a black m-Si cell with efficiency of 15.8% was achieved by using SiO(2) and SiN(X) bilayer passivation structure, ind...Continue Reading

References

Sep 23, 2010·Advanced Materials·Martin OttoRalf B Wehrspohn

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Citations

Jan 9, 2013·Physical Chemistry Chemical Physics : PCCP·Y WangX L Du
May 17, 2013·Physical Chemistry Chemical Physics : PCCP·Yen-Tien Lu, Andrew R Barron
Jan 2, 2016·Journal of Colloid and Interface Science·Vanessa H FragalRafael Silva
Jun 4, 2015·Scientific Reports·Yan WangDu Xiaolong
Aug 18, 2016·Nanoscale·Fatima ToorMarcie R Black
Dec 25, 2019·Applied Optics·Fatemeh Malekmohammad, Mohammad Malekmohammad
Dec 31, 2020·Nanomaterials·Zheng FanShubin Yan
Jun 24, 2021·Nanoscale·Jun YanJianhui Chen

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