Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography

Langmuir : the ACS Journal of Surfaces and Colloids
Vivek M PrabhuChristopher K Ober

Abstract

Lithographic feature size requirements have approached a few radius of gyration of photoresist polymers used in thin-film patterning. Furthermore, the feature dimensions are commensurate with the photoacid diffusion length that defines the underlying latent image. Smaller imaging building blocks may enable reduced feature sizes; however, resolution limits are also dependent upon the spatial extent of the photoacid-catalyzed reaction diffusion front and subsequent dissolution mechanism. The reaction-diffusion front was characterized by neutron reflectivity for ccc stereoisomer-purified, deuterium-labeled tert-butoxycarbonyloxy calix[4]resorcinarene molecular resists. The spatial extent of the reaction front exceeds the size of the molecular resist with an effective diffusion constant of (0.13 ± 0.06) nm(2)/s for reaction times longer than 60 s, with the maximum at shorter times. Comparison to a mean-field reaction-diffusion model shows that a photoacid trapping process provides bounds to the spatial and extent of reaction via a reaction-limited mechanism whereas the ratio of the reaction rate to trapping rate constants recovers the effective diffusion peak. Under the ideal step-exposure conditions, surface roughness was observed...Continue Reading

References

Oct 14, 2000·Annual Review of Physical Chemistry·M D Ediger
Apr 20, 2005·Langmuir : the ACS Journal of Surfaces and Colloids·Joseph L LenhartMarie Angelopoulos
Nov 17, 2006·Langmuir : the ACS Journal of Surfaces and Colloids·Ashwin RaoM Muthukumar
Feb 1, 2007·Chemical Society Reviews·L BaldiniR Ungaro
Oct 24, 2007·The Journal of Chemical Physics·R A L ValléeK Binder
Dec 5, 2008·The Journal of Physical Chemistry. B·Vivek M PrabhuSushil K Satija
Sep 18, 2010·Advanced Materials·Vivek M PrabhuWen-li Wu

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