PMID: 11336212May 5, 2001Paper

Numerical feasibility study of the fabrication of subwavelength structure by mask lithography

Journal of the Optical Society of America. A, Optics, Image Science, and Vision
H Ichikawa, H Kikuta

Abstract

Electromagnetic diffraction of a light wave by a single aperture of subwavelength width and subsequent propagation in a lossy medium are numerically investigated. This diffraction problem simulates exposure of a resist with an amplitude mask. It is found that there is the possibility of fabricating a lambda/2 structure on a resist of lambda/4 thickness, where lambda is the wavelength of the exposing light in vacuum, by conventional contact or by proximity lithography. It is also found that an air gap between a mask and a resist of up to lambda/2 does not have a significant effect on resolution. This approach permits easy and cost-effective fabrication of subwavelength structures and leads to wide availability of diffractive optical elements in the nonscalar domain.

References

Jan 23, 1995·Physical Review Letters·O J MartinA Dereux
Sep 28, 1998·Optics Express·O MartinB Michel

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Citations

May 12, 2012·Mediators of Inflammation·Konstantinos KaratoliosSabine Pankuweit
Jun 7, 2011·Optics Express·Alexandre AprilMichel Piché

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