Post deposition annealing of epitaxial Ce(1-x)Pr(x)O(2-δ) films grown on Si(111)

Physical Chemistry Chemical Physics : PCCP
H WilkensJ Wollschläger

Abstract

In this work the structural and morphological changes of Ce1-xPrxO2-δ (x = 0.20, 0.35 and 0.75) films grown on Si(111) due to post deposition annealing are investigated by low energy electron diffraction combined with a spot profile analysis. The surface of the oxide films exhibit mosaics with large terraces separated by monoatomic steps. It is shown that the Ce/Pr ratio and post deposition annealing temperature can be used to tune the mosaic spread, terrace size and step height of the grains. The morphological changes are accompanied by a phase transition from a fluorite type lattice to a bixbyite structure. Furthermore, at high PDA temperatures a silicate formation via a polycrystalline intermediate state is observed.

References

Feb 19, 2002·Chemical Reviews·Gin-ya Adachi Gy, Nobuhito Imanaka
Feb 14, 2004·Science·G A DelugaX E Verykios
Oct 1, 2013·Physical Chemistry Chemical Physics : PCCP·H WilkensJ Wollschläger
Sep 26, 2014·ACS Applied Materials & Interfaces·Gang NiuThomas Schroeder

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Citations

Jul 12, 2016·The Journal of Physical Chemistry. a·Meiyuan GuoMarcus Lundberg

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