Proton beam writing of three-dimensional nanostructures in hydrogen silsesquioxane

Nano Letters
J A van KanFrank Watt

Abstract

Proton beam writing (p-beam writing) is a promising new direct-write lithographic technique for three-dimensional nanofabrication. In p-beam writing a megaelectronvolt proton beam is focused to a sub-100-nm spot size and scanned over a suitable resist material. Unlike electrons, when a proton beam interacts with resist it follows an almost straight path resulting in high aspect ratio structures with vertical, smooth sidewalls. The secondary electrons induced by the primary proton beam have low energy and therefore limited range, resulting in minimal proximity effects. Hydrogen silsesquioxane has been identified as a superior resist for p-beam writing, allowing the production of high-aspect-ratio structures down to 22 nm.

Citations

Oct 7, 2009·Proceedings of the National Academy of Sciences of the United States of America·Ce ZhangJohan R C van der Maarel
Mar 3, 2012·The Review of Scientific Instruments·J A van KanArmin Baysic de Vera
Jun 17, 2008·The Journal of Chemical Physics·Ce ZhangJohan R C van der Maarel
Jul 31, 2013·Biomicrofluidics·Jeroen A van KanJohan R C van der Maarel
Sep 5, 2013·Nucleic Acids Research·Ce ZhangJohan R C van der Maarel
Jan 4, 2012·Journal of Tissue Engineering and Regenerative Medicine·Sanna TurunenMinna Kellomäki
Mar 5, 2016·The Review of Scientific Instruments·N LiuJ A van Kan
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Feb 20, 2018·Soft Matter·Durgarao GuttulaJohan R C van der Maarel
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May 26, 2011·Physical Chemistry Chemical Physics : PCCP·Yanwen ZhangWilliam J Weber
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Jan 8, 2019·The Journal of Physical Chemistry Letters·Rajib BasakJohan R C van der Maarel
Oct 31, 2020·Biophysical Journal·Rajib BasakJohan R C van der Maarel

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