Abstract
Periodic diffractive elements known as metasurfaces constitute platform technology whereby exceptional optical properties, not attainable by conventional means, are attained. Generally, with increasing unit-cell complexity, there emerges a wider design space and bolstered functional capability. Advanced devices deploying elaborate unit cells are typically generated by electron-beam patterning which is a tedious, slow process not suitable for large surfaces and quick turnaround. Ameliorating this condition, we present a novel route towards facile fabrication of complex periodic metasurfaces based on sequential exposures by laser interference lithography. Our method is fast, cost-effective, and can be applied to large surface areas. It is enabled by precise control over periodicity and exposure energy. With it we have successfully patterned and fabricated one-dimensional (1D) and two-dimensional (2D) multipart unit cell devices as demonstrated here. Thus, zero-order transmission spectra of an etched four-part 1D grating device are simulated and measured for both transverse-electric (TE) and transverse-magnetic (TM) polarization states of normally incident light. We confirm non-resonant wideband antireflection (∼800 nm) for TM-pol...Continue Reading
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