The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

Accounts of Chemical Research
Seán T BarryFrancisco Zaera

Abstract

The deposition of thin solid films is central to many industrial applications, and chemical vapor deposition (CVD) methods are particularly useful for this task. For one, the isotropic nature of the adsorption of chemical species affords even coverages on surfaces with rough topographies, an increasingly common requirement in microelectronics. Furthermore, by splitting the overall film-depositing reactions into two or more complementary and self-limiting steps, as it is done in atomic layer depositions (ALD), film thicknesses can be controlled down to the sub-monolayer level. Thanks to the availability of a vast array of inorganic and metalorganic precursors, CVD and ALD are quite versatile and can be engineered to deposit virtually any type of solid material. On the negative side, the surface chemistry that takes place in these processes is often complex, and can include undesirable side reactions leading to the incorporation of impurities in the growing films. Appropriate precursors and deposition conditions need to be chosen to minimize these problems, and that requires a proper understanding of the underlying surface chemistry. The precursors for CVD and ALD are often designed and chosen based on their known thermal chemist...Continue Reading

References

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Oct 18, 2012·Chemical Society Reviews·Francisco Zaera
Aug 27, 2014·Nanoscale·A J M MackusW M M Kessels
May 17, 2012·The Journal of Physical Chemistry Letters·Francisco Zaera
Sep 6, 2012·The Journal of Physical Chemistry Letters·Huaxing SunFrancisco Zaera
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Feb 10, 2017·The Journal of Chemical Physics·Yunxi YaoFrancisco Zaera
Jun 28, 2017·The Journal of Physical Chemistry. C, Nanomaterials and Interfaces·Yichen DuanAndrew V Teplyakov

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Citations

Feb 3, 2020·The Journal of Chemical Physics·Nathaniel E RicheyStacey F Bent
May 19, 2021·Dalton Transactions : an International Journal of Inorganic Chemistry·Octavio GranielDavid Muñoz-Rojas
Aug 2, 2018·The Journal of Physical Chemistry Letters·Clinton LienFrancisco Zaera
Feb 19, 2019·Chemistry of Materials : a Publication of the American Chemical Society·Adriaan J M MackusWilhelmus M M Kessels

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