Ultralow-refractive-index optical thin films through nanoscale etching of ordered mesoporous silica films

Optics Letters
Fangting ChiXiaodong Yuan

Abstract

A great deal of intensive research has been conducted to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films for microptics and microelectronics applications. Here, we report a simple procedure to prepare highly porous silica thin films with high optical quality and water resistance through nano-etching of mesoporous silica films followed by fluoroalkylsilane surface modification. The films possess an ultralow refractive index of 1.03 (800 nm) and an ultralow dielectric constant of 1.30 (100 kHz), to our knowledge the lowest values ever reported in thin film materials. The films are superhydrophobic (water contact angle=156  deg), thus exhibit high moisture stability.

References

Dec 14, 2005·Langmuir : the ACS Journal of Surfaces and Colloids·Cédric BoissiereClément Sanchez
May 17, 2006·Langmuir : the ACS Journal of Surfaces and Colloids·Tommaso BaldacchiniEric Mazur
Jul 3, 2009·Optics Letters·Masato YamaguchiHiroaki Imai

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Citations

Feb 12, 2013·Chemical Society Reviews·Plinio Innocenzi, Luca Malfatti
Jan 1, 2014·Nano Convergence·Elchin HuseynovRavan Mehdiyeva

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