Wafer-Scale Growth of Pristine and Doped Monolayer MoS2 Films for Electronic Device Applications

Inorganic Chemistry
Dongsheng WangZhiyong Wang

Abstract

Scalable production and controlled doping of large-area two-dimensional transition-metal dichalcogenide films are fundamental steps toward their applications in electronic devices. Although a variety of methods for preparation of wafer-scale transition-metal dichalcogenide films have been developed, it is still challenging to realize homogeneous doping of the large-area films to modulate their electronic properties. In this paper, we report a new chemical vapor deposition (CVD) method for preparation of wafer-scale pristine and doped monolayer MoS2 films on 2-inch sapphire wafers. The molybdenum precursors are supplied in a "face-to-face" manner from a silica gel plate to the sapphire wafer, which guarantees uniform nucleation and growth of monolayer MoS2. This method can be used to prepare substitutionally doped monolayer MoS2 films. By using ReCl3 as the dopant precursor, we have obtained continuous Re-doped monolayer MoS2 films on sapphire wafers. Elemental analysis confirms successful Re-doping of the MoS2 film. Spherical aberration-corrected scanning transmission electron microscopy characterization reveals that the Re atoms are incorporated at the substitutional Mo sites in the MoS2 lattice. The incorporation of Re atoms ...Continue Reading

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